Web23 Jun 2024 · Butsurin Jinnai, Takuji Uesugi, Koji Koyama et al.-The effects of polymer side-chain structure on roughness formation of ArF photoresist in plasma etching processes Takuji Uesugi, Takeru Okada, Akira Wada et al.-Dependence of polymer main-chain structure on roughness formation of ArF WebButsurin Jinnai’s Post Butsurin Jinnai 1y Report this post Report Report. Back Submit. Hope our work presented at IEDM to be viral in the field. MRAM-Info 845 followers ...
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Web1 record for Butsurin Jinnai. Find Butsurin Jinnai's phone number, address, and email on Spokeo, the leading online directory for contact information. Web13 May 2024 · Butsurin Jinnai, Shun Kanai, Jun’ichi Ieda, Shunsuke Fukami & Hideo Ohno Nature Materials 20 , 1364–1370 ( 2024) Cite this article 13k Accesses 49 Citations 63 Altmetric Metrics Abstract... shows about paranormal activity
Butsurin Jinnai
WebButsurin Jinnai Top journals Journal of Physics D Applied Physics (4) Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (1) Affiliations Tohoku University Department Institute of... Web16 Sep 2010 · @article{Jinnai2010DecisiveFA, title={Decisive factors affecting plasma resistance and roughness formation in ArF photoresist}, author={Butsurin Jinnai and … Web8 Dec 2024 · “The performance proves the developed MTJs’ capability to work with the future-generation advanced integrated circuits,” said Butsurin Jinnai, the first author of the study. “Because of its material compatibility with the standard MTJ material system, CoFeB/MgO, the proposed MTJ structure can be easily adopted in the existing MTJ … shows about new orleans